论文的第一部分是关于芳香酯缩醛聚合物的合成及应用的研究。采用常见的芳香酸和1,4-环己基二甲醇二乙烯基醚聚合，得到了三种新型的芳香酯缩醛聚合物，这类聚合物在各种常用溶剂如丙二醇甲醚醋酸酯（PGMEA）、二氧六环、氯仿和四氢呋喃中有较好的溶解性，分子量（Mn）6000～7000，热分解温度在230 ℃左右。这几种酯缩醛聚合物在室温和稍高温度下即可酸解，因此与产酸剂可组合成化学增幅型光致抗蚀剂。用室温能酸解的聚合物1,4-萘二酸-1,4-环己基二甲醇二乙烯基醚与酚醛树脂及三嗪产酸剂组成的成像体系可用于i-线光致抗蚀剂，得到了分辨率为2～3µm的清晰图像。研究了该成像体系用作PS版的感光剂的感光成像性能，以胶印晒版测控条为掩模，分辨率为8µm，2～98%网点能还原。同时也研究了该感光成像体系加入红外染料用作阳图热敏CTP版的热敏组成物的感热成像性能，在实验室的红外扫描的条件下可得到清晰的感热成像效果。 论文的第二部分是关于不含苯环的酯缩醛聚合物合成及应用的研究。采用一种含有多元脂环的二酸——丙烯海松酸（APA）和1,4-环己基二甲醇二乙烯基醚（CHDDE）聚合得到了一种非芳香酯缩醛聚合物APA-CHDDE，该聚合物同样具有较好的溶解性，较强的酸解活性，在248nm处有很好的透明性，与硫鎓盐产酸剂可组成适用于248-nm化学增幅型正性光致抗蚀剂。同样研究了聚合物APA-CHDDE与酚醛树脂及三嗪产酸剂组成的成像体系用作PS版的感光剂及和红外染料组合作为阳图热敏CTP版的感热成像组成物的成像性能，也获得了很好的成像效果。由于丙烯海松酸含有双键，在193nm有较强吸收，不能用于193-nm光致抗蚀剂，因此尝试通过溴化、羟基化、氢化三种化学反应对丙烯海松酸进行了去双键的改性，可使丙烯海松酸在193nm的吸收明显降低，但这些反应存在产率不高、重复性差等问题，有待于进一步的研究。

In the first part of this paper, three ester acetal polymers were synthesized by the reaction of common aromatic dicarboxylic acids with 1,4-cyclohexanedimethanol divinyl ether. These polymers are solubile in commonly used solvents such as propylene glycol methyl ether acetate (PGMEA)、1,4-dioxane、chloroform and tetrahydrofuran.The molecular weights of the acetal polymers are measured 6000 - 7000(Mn).The polymers show high thermal stability. The acidolytic reaction of the polymers undergoes rapidly at room temperature or at a little higher temperature. Making use of the acidolysis activity at room temperature of the acetal polymer 1,4-naphthalene dicarboxylic acid-1,4-cyclohexanedimethanol divinyl ether (1,4-NDA- CHDDE),we can form new type of chemically amplified positive i-line photoresist with the main contents including phenolic resin, the acetal polymer and PAG(s-triazine).Clear pattern with resolution of 2-3µm was obtained in the lithographic experiment of the photoresist. The photoresist was also investigated as the photosensitive materials for the PS plate and as thermal sensitive imaging composition for positive thermosensitive CTP plate with addition of IR dye. Good imaging results were obtained .In the second part, acrylpimaric acid,a compond with multi-alicyclic structure, was reacted with 1,4-cyclohexanedimethanol divinyl ether, to give novel ester acetal polymer APA-CHDDE without phenylgroup.The property of the polymer is similar to that of poly(1,4-NDA-CHDDE), such as good solubility in commom solvents, high thermal stability and acidolysis activity . Different from the polymer 1,4-NDA-CHDDE, poly (APA-CHDDE) shows very high transparency at 248nm and can be used to form 248-nm photoresist . However, it should be the residual double bond of acrylpimaric acid that results in the strong absorption at 193nm. Reactions, such as oxidation reaction and reduction reaction, were taken to diminish the residual double bond to single bond. The transparency of the production was apparently improved. However, these reactions are complicated and need further investigated.